Dr. Heidi B. Cao
Senior Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Image processing, Diffusion, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Transparency, Polymers, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Absorption

SPIE Journal Paper | 1 October 2007
JM3 Vol. 6 Issue 04
KEYWORDS: Line edge roughness, Monte Carlo methods, Lithography, Molecules, Diffusion, Image enhancement, Electron beam lithography, Ionization, Electron beams, Polymers

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Optical lithography, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Performance modeling, Systems modeling, Photoresist developing, Standards development

Proceedings Article | 6 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Modeling, Polymethylmethacrylate, Data modeling, Polymers, Spectroscopy, Photons, Molecules, Ionization, Extreme ultraviolet, Process modeling

Proceedings Article | 4 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Mirrors, Contamination, Calibration, Molecules, Mass spectrometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Analytical research, EUV optics

Showing 5 of 27 publications
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