Heidi J. Hockel
at CREOL The College of Optics and Photonics
SPIE Involvement:
Conference Program Committee | Author
Publications (6)

SPIE Journal Paper | October 1, 2005
JM3 Vol. 4 Issue 04
KEYWORDS: Photomasks, Binary data, Analog electronics, Optical design, Microlens, Photoresist materials, Micro optics, Diffraction gratings, Semiconducting wafers, Transmittance

PROCEEDINGS ARTICLE | January 22, 2005
Proc. SPIE. 5720, Micromachining Technology for Micro-Optics and Nano-Optics III
KEYWORDS: Data modeling, Waveguides, Fiber Bragg gratings, Cladding, Dispersion, Polymers, Silicon, Reflectivity, Semiconducting wafers, Polymer multimode waveguides

PROCEEDINGS ARTICLE | January 22, 2005
Proc. SPIE. 5720, Micromachining Technology for Micro-Optics and Nano-Optics III
KEYWORDS: Fabrication, Optical design, Retroreflectors, Silica, Etching, Metals, Micro optics, Photomasks, Analog electronics, Semiconducting wafers

PROCEEDINGS ARTICLE | December 29, 2003
Proc. SPIE. 5347, Micromachining Technology for Micro-Optics and Nano-Optics II
KEYWORDS: Optical components, Lithography, Additive manufacturing, Photoresist materials, Solids, Micro optics, Photomasks, Beam shaping, Chemical elements, Liquids

PROCEEDINGS ARTICLE | December 29, 2003
Proc. SPIE. 5347, Micromachining Technology for Micro-Optics and Nano-Optics II
KEYWORDS: Wafer-level optics, Diffraction, Optical design, Reticles, Micro optics, Photomasks, Analog electronics, Semiconducting wafers, Binary data, Diffraction gratings

PROCEEDINGS ARTICLE | January 17, 2003
Proc. SPIE. 4984, Micromachining Technology for Micro-Optics and Nano-Optics
KEYWORDS: Lithography, Reticles, Lenses, Etching, Additive manufacturing, Photoresist materials, Micro optics, Photomasks, Optical alignment, Semiconducting wafers

Showing 5 of 6 publications
Conference Committee Involvement (1)
Micromachining Technology for Micro-Optics and Nano-Optics IV
23 January 2006 | San Jose, California, United States
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