Dr. Heiko Feldmann Profile

Dr. Heiko Feldmann

Senior Principal at Carl Zeiss SMT GmbH

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Author

Publications (8)

Proceedings Article | 16 October 2019 Presentation

Advancing EUV lithography optics (Conference Presentation)

Heiko Feldmann, Olaf Conradi, Paul Graeupner, Jan van Schoot, Peter Kuerz, Winfried Kaiser

Proceedings Volume 11147, 1114704 (2019) https://doi.org/10.1117/12.2538927

KEYWORDS: Extreme ultraviolet lithography, EUV optics, Scanners, Imaging systems, Projection systems, Lithographic illumination, Optical design, Double patterning technology, Extreme ultraviolet, Mirrors

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Proceedings Article | 5 April 2011 Paper

AIMS EUV: the actinic aerial image review platform for EUV masks

Dirk Hellweg, Johannes Ruoff, Alois Herkommer, Joachim Stühler, Thomas Ihl, Heiko Feldmann, Michael Ringel, Ulrich Strößner, Sascha Perlitz, Wolfgang Harnisch

Proceedings Volume 7969, 79690H (2011) https://doi.org/10.1117/12.879422

KEYWORDS: Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Photomasks, EUV optics, Reticles, Projection systems, Optics manufacturing, Charge-coupled devices, Artificial intelligence

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Proceedings Article | 2 April 2011 Paper

Concept and feasibility of aerial imaging measurements on EUV masks

Sascha Perlitz, Wolfgang Harnisch, Ulrich Strößner, Heiko Feldmann, Dirk Hellweg, Michael Ringel

Proceedings Volume 7985, 79850U (2011) https://doi.org/10.1117/12.895208

KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Reticles, Particles, Lithography, Metrology, Airborne remote sensing, Electromagnetic coupling

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Proceedings Article | 20 March 2010 Paper

Actinic review of EUV masks

Heiko Feldmann, Johannes Ruoff, Wolfgang Harnisch, Winfried Kaiser

Proceedings Volume 7636, 76361C (2010) https://doi.org/10.1117/12.848380

KEYWORDS: Extreme ultraviolet, Photomasks, Mirrors, Scanners, Extreme ultraviolet lithography, EUV optics, Metrology, Zone plates, Photons, Imaging systems

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Proceedings Article | 19 July 2006 Paper

Use of diffractive lenses in lithographic projection lenses

H.-J. Rostalski, A. Epple, H. Feldmann

Proceedings Volume 6342, 63421S (2006) https://doi.org/10.1117/12.692314

KEYWORDS: Lenses, Lithography, Diffractive optical elements, Lens design, Colorimetry, Combined lens-mirror systems, Chromatic aberrations, Calcium, Mirrors, Optical design

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Proceedings Article | 15 March 2006 Paper

Catadioptric lens design: the breakthrough to hyper-NA optics

Bernhard Kneer, Paul Gräupner, Reiner Garreis, Ralph Kläsges, Heiko Feldmann

Proceedings Volume 6154, 615420 (2006) https://doi.org/10.1117/12.668024

KEYWORDS: Mirrors, Combined lens-mirror systems, Lens design, Coating, Optical design, Polarization, Chemical elements, Reticles, Stray light, Water

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Proceedings Article | 15 October 2005 Paper

Catadioptric projection lenses for immersion lithography

Heiko Feldmann, Aurelian Dodoc, Alexander Epple, Hans-Jürgen Rostalski, David Shafer, Wilhelm Ulrich

Proceedings Volume 5962, 59620Y (2005) https://doi.org/10.1117/12.625199

KEYWORDS: Mirrors, Combined lens-mirror systems, Lenses, Lithography, Refractor telescopes, Immersion lithography, Optical design, Monochromatic aberrations, Beam splitters, Relays

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Proceedings Article | 15 October 2005 Paper

Use of diffractive optical elements in lithographic projection lenses

H.-J. Rostalski, A. Epple, H. Feldmann

Proceedings Volume 5962, 59621A (2005) https://doi.org/10.1117/12.625192

KEYWORDS: Lenses, Diffractive optical elements, Lithography, Lens design, Colorimetry, Combined lens-mirror systems, Chromatic aberrations, Calcium, Mirrors, Glasses

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Showing 5 of 8 publications

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