Dr. Heiko Feldmann
Principal at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Photomasks, EUV optics, Reticles, Projection systems, Optics manufacturing, Charge-coupled devices, Artificial intelligence

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Reticles, Particles, Lithography, Metrology, Airborne remote sensing, Electromagnetic coupling

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Extreme ultraviolet, Photomasks, Mirrors, Scanners, Extreme ultraviolet lithography, EUV optics, Metrology, Zone plates, Photons, Imaging systems

PROCEEDINGS ARTICLE | July 19, 2006
Proc. SPIE. 6342, International Optical Design Conference 2006
KEYWORDS: Lenses, Lithography, Diffractive optical elements, Lens design, Colorimetry, Combined lens-mirror systems, Chromatic aberrations, Calcium, Mirrors, Optical design

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Mirrors, Combined lens-mirror systems, Lens design, Coating, Optical design, Polarization, Chemical elements, Reticles, Stray light, Water

PROCEEDINGS ARTICLE | October 15, 2005
Proc. SPIE. 5962, Optical Design and Engineering II
KEYWORDS: Mirrors, Combined lens-mirror systems, Lenses, Lithography, Refractor telescopes, Immersion lithography, Optical design, Monochromatic aberrations, Beam splitters, Relays

Showing 5 of 7 publications
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