Dr. Heiko Feldmann
Principal at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Particles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Airborne remote sensing

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Metrology, Imaging systems, Scanners, Photons, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Zone plates, EUV optics

PROCEEDINGS ARTICLE | July 19, 2006
Proc. SPIE. 6342, International Optical Design Conference 2006
KEYWORDS: Chromatic aberrations, Lithography, Mirrors, Optical design, Diffractive optical elements, Lenses, Calcium, Lens design, Colorimetry, Combined lens-mirror systems

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Mirrors, Optical design, Reticles, Polarization, Water, Coating, Lens design, Chemical elements, Stray light, Combined lens-mirror systems

PROCEEDINGS ARTICLE | October 15, 2005
Proc. SPIE. 5962, Optical Design and Engineering II
KEYWORDS: Lithography, Monochromatic aberrations, Mirrors, Optical design, Beam splitters, Lenses, Relays, Immersion lithography, Refractor telescopes, Combined lens-mirror systems

Showing 5 of 7 publications
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