Heiko Weichert
at Tokyo Electron Europe Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Manufacturing, Control systems, Scanning electron microscopy, Process control, Immersion lithography, High volume manufacturing, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Image processing, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Optical lithography, Calibration, Silicon, Scatterometry, Integration, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Wafer testing

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Metrology, Optical lithography, Diffractive optical elements, Molecular bridges, Image processing, Scanners, Particles, Manufacturing, Bridges, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Lithography, Metrology, 3D modeling, Scatterometry, Data processing, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Process modeling

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