Dr. Helder Alves
at Vistec Electron Beam Lithography Group
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Electron beam lithography, Etching, Glasses, Silicon, Manufacturing, Kinematics, Plasma etching, Silicon carbide, Semiconducting wafers

Proceedings Article | 3 April 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Lithography, Electron beams, Teeth, Reflection, Sensors, Silicon, Monte Carlo methods, Objectives, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Signal to noise ratio, Lithography, Electron beams, Scattering, Sensors, Etching, Monte Carlo methods, Signal detection, Vestigial sideband modulation, Direct write lithography

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Signal to noise ratio, Lithography, Electron beams, Optical lithography, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Signal detection, Wafer testing, Overlay metrology

Proceedings Article | 26 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Signal to noise ratio, Lithography, Sensors, Silicon, Monte Carlo methods, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Signal detection, Vestigial sideband modulation

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