Dr. Helen R. Armer
Applied Knowledge Base Director at Applied Materials Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Optical lithography, Scanners, Manufacturing, Inspection, Time metrology, Semiconducting wafers, Control systems design, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top