Dr. Helen R. Armer
Applied Knowledge Base Director at Applied Materials Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconducting wafers, Metrology, Time metrology, Manufacturing, Overlay metrology, Inspection, Lithography, Optical lithography, Control systems design, Scanners

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