Dr. Helmut Schift
Head polymer nanotechnology group at Paul Scherrer Institut
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
nanoimprint lithography , mold fabrication , roll embossing , 3D lithography , injection molding
Profile Summary

Helmut Schift is head of the Polymer Nanotechnology Group in the Laboratory for Micro- and Nanotechnology at the Paul Scherrer Institut. He received his diploma in Electrical Engineering from the University of Karlsruhe, and performed his PhD studies at the Institute of Microtechnology Mainz. After his graduation in 1994, he joined PSI as a research staff member. His current research interests include innovative 3-D stamp fabrication and nanomolding processes, including roll embossing and injection molding.
Publications (14)

SPIE Journal Paper | January 6, 2018
OE Vol. 57 Issue 04
KEYWORDS: Vacuum ultraviolet, Polymethylmethacrylate, Polymers, Surface roughness, Surface finishing, Micro optics, Lenses, Glasses, Two photon polymerization, Polymerization

PROCEEDINGS ARTICLE | January 2, 2018
Proc. SPIE. 10456, Nanophotonics Australasia 2017
KEYWORDS: Lithography, Electron beam lithography, Microlens array, Polymethylmethacrylate, Two photon polymerization, Lenses, Polymers, Surface roughness, Microlens, Surface finishing

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Polymethylmethacrylate, Polymers, Ultraviolet radiation, Micro optics, Microlens, Surface finishing, 3D microstructuring

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Prisms, Polymethylmethacrylate, Lenses, Polymers, Glasses, Ultraviolet radiation, Surface roughness, Optical testing, Scanning electron microscopy, Microlens, Vacuum ultraviolet, Surface finishing, Absorption

PROCEEDINGS ARTICLE | February 24, 2017
Proc. SPIE. 10095, Laser 3D Manufacturing IV
KEYWORDS: Lithography, Electron beam lithography, Microlens array, Polymethylmethacrylate, Two photon polymerization, Lenses, Polymers, Glasses, Manufacturing, Surface roughness, Micro optics, Microlens, Nanoimprint lithography, Vacuum ultraviolet, Surface finishing

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Electron beams, Dry etching, Polymers, Scanning electron microscopy, Reactive ion etching, Plasma

Showing 5 of 14 publications
Conference Committee Involvement (6)
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
24 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Showing 5 of 6 published special sections
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