Dr. Hendrik Steigerwald
Engineering Manager Mask Metrology at KLA MIE GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10810, Photomask Technology 2018

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Reticles, Photomasks, Image registration, Semiconducting wafers, Extreme ultraviolet, Overlay metrology, Metrology, Manufacturing, Lithography

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Extreme ultraviolet, Metrology, Photomasks, Extreme ultraviolet lithography, Overlay metrology, Semiconducting wafers, Reticles

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Photomasks, Image registration, Semiconducting wafers, Extreme ultraviolet, Metrology, Overlay metrology, Manufacturing, Time metrology, Lithography

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Optical lithography, Immersion lithography, Air contamination, Optical properties, Detection and tracking algorithms, High volume manufacturing

Showing 5 of 8 publications
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