Heng-Hsin Liu
Dept Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Publications (13)

Proceedings Article | 31 March 2014 Paper
R. Peng, Tony Wu, H. Liu
Proceedings Volume 9052, 90521I (2014) https://doi.org/10.1117/12.2047373
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical lithography, Laser stabilization, Optical simulations, Light sources, Lithography, Panoramic photography, Laser applications, Laser optics

Proceedings Article | 13 March 2012 Paper
R. Peng, I. Huang, H. Liu, H. J. Lee, John Lin, Arthur Lin, Allen Chang, Benjamin Szu-Min Lin, Ivan Lalovic
Proceedings Volume 8326, 83260X (2012) https://doi.org/10.1117/12.916420
KEYWORDS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Optical lithography, Photomasks, Photoresist materials, Logic, Optical simulations, Cadmium

Proceedings Article | 2 April 2010 Paper
C. Ke, Victor Shih, Jacky Huang, L. Chen, Willie Wang, G. Huang, W. Yang, Sophia Wang, C. Liang, H. Liu, H. Lee, L. Terng, T. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Marc Noot, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Gavin Liu, Wei-Shun Tzeng, Jim Chen, Andreas Fuchs, Omer Adam, Cathy Wang
Proceedings Volume 7638, 76383P (2010) https://doi.org/10.1117/12.853318
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Back end of line, Lithography, 3D metrology, Finite element methods, Scatterometry, Critical dimension metrology

Proceedings Article | 12 December 2009 Paper
Tsung-Chih Chien, C. Y. Shih, R. C. Peng, H. H. Liu, Y. C. Chen, H. J. Lee, John Lin, K. W. Chang, C. M. Wu, W. H. Hung, Tommy Lee, H. C. Wu, X. Xie, W. J. Shao, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh
Proceedings Volume 7520, 75201Q (2009) https://doi.org/10.1117/12.842551
KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

Proceedings Article | 11 December 2009 Paper
Victor Shih, Jacky Huang, Willie Wang, G. T. Huang, H. L. Chung, Alan Ho, W. T. Yang, Sophia Wang, Chih-Ming Ke, L. J. Chen, C. R. Liang, H. H. Liu, H. J. Lee, L. G. Terng, T. S. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Dennis Chang, Cathy Wang, Andreas Fuchs, Omer Adam, Karel van der Mast
Proceedings Volume 7520, 75201A (2009) https://doi.org/10.1117/12.837353
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Lithography, Back end of line, Metals, Scatterometry, Front end of line, Signal to noise ratio

Showing 5 of 13 publications
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