Henry Chen
at Changxin Memory Technologies Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Photomasks, Optical proximity correction, Optical alignment, Semiconducting wafers, Overlay metrology, Phase shifts

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Light sources, Scanners, Reliability, Optical alignment, Semiconducting wafers, Signal detection

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