Henry Megens
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Logic, Sensors, Scanners, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Lithographic process control

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Polarization, Sensors, Etching, Scanners, Monte Carlo methods, Optical alignment, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Metrology, Lithium, Scanners, Time metrology, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Process modeling

Proceedings Article | 13 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Metrology, Optical lithography, Scanners, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Diffraction, Metrology, Scanners, Control systems, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Diffraction gratings

Showing 5 of 19 publications
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