Henry Yu
at D2S Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 21 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Data modeling, Inspection, Scanning electron microscopy, Gallium nitride, Digital imaging, Neural networks, Photomasks, Semiconductor manufacturing, Computer aided design, Semiconducting wafers

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