Dr. Henry K. Yun
Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Deep ultraviolet, Particles, Manufacturing, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Silica, Particles, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Vacuum ultraviolet, Ruthenium

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Logic, Glasses, Manufacturing, Inspection, Pellicles, Data processing, Photomasks, Optical proximity correction, Photomask technology, Binary data

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Etching, Particles, Ions, Manufacturing, Inspection, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Optical spheres, Defect detection, Quartz, Glasses, Particles, Inspection, Atomic force microscopy, Extreme ultraviolet, Surface finishing, Chemical mechanical planarization

Showing 5 of 11 publications
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