Dr. Hermann A. Gross
at Physikalisch Technische Bundesanstalt
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | June 21, 2015
Proc. SPIE. 9526, Modeling Aspects in Optical Metrology V
KEYWORDS: Metrology, Atomic force microscopy, Scatterometry, Inverse problems, Finite element methods, Photomasks, Scatter measurement, Inverse optics, Chaos, Bayesian inference

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Silicon, Atomic force microscopy, Scatterometry, Reflectometry, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Scatter measurement

PROCEEDINGS ARTICLE | May 13, 2013
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Mathematical modeling, Data modeling, Scatterometry, Monte Carlo methods, Inverse problems, Photomasks, Extreme ultraviolet, Scatter measurement, Statistical modeling, Inverse optics

PROCEEDINGS ARTICLE | May 13, 2013
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Mathematical modeling, Diffraction, Deep ultraviolet, Numerical simulations, Scatterometry, Finite element methods, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Diffraction, Cadmium, Optical testing, Scatterometry, Finite element methods, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | October 25, 2012
Proc. SPIE. 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
KEYWORDS: Modeling, Diffraction, Metrology, Calibration, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Scatter measurement, Standards development, Data analysis

Showing 5 of 15 publications
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