Dr. Herschel M. Marchman
Senior Applications Engineer at
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 19, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Signal to noise ratio, Lithography, Electron beams, Etching, Molecules, Ions, Image resolution, Scanning electron microscopy, Ion beams, Photomasks

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Electron beam lithography, Metrology, Silicon, Photomasks, Line width roughness, Transistors, Field effect transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Electron beams, Etching, Molecules, Interfaces, Coating, Scanning electron microscopy, Photoresist materials, Ion beams, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymers, Atomic force microscopy, Oxygen, Monte Carlo methods, Dimensional metrology, Critical dimension metrology, 193nm lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top