Dr. Herschel M. Marchman
Senior Applications Engineer
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 19 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Signal to noise ratio, Lithography, Electron beams, Etching, Molecules, Ions, Image resolution, Scanning electron microscopy, Ion beams, Photomasks

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Electron beam lithography, Metrology, Silicon, Photomasks, Line width roughness, Transistors, Field effect transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Electron beams, Etching, Molecules, Interfaces, Coating, Scanning electron microscopy, Photoresist materials, Ion beams, Photomasks, Semiconducting wafers

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymers, Atomic force microscopy, Oxygen, Monte Carlo methods, Dimensional metrology, Critical dimension metrology, 193nm lithography

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