Hesham M. Abdelghany
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Control systems, Neural networks, Machine learning, Optical proximity correction, SRAF, Neurons

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Optical lithography, Data modeling, Etching, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement, Process modeling

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Error analysis, Inspection, Attenuators, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Lithography, Databases, Silicon, Photomasks, Optical proximity correction, Semiconducting wafers, Electronic design automation, Model-based design, 193nm lithography

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