Mr. Hesham A. Maaty Omar
Engineer at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photovoltaics, Visualization, Electroluminescence, Photomasks, Shape analysis, Optical proximity correction, Photomask technology, Lead, Current controlled current source

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photovoltaics, Image processing, Error analysis, Printing, SRAF, Critical dimension metrology, Semiconducting wafers, Antimony, Tolerancing, Model-based design

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Detection and tracking algorithms, Metals, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Yield improvement, Process modeling, Resolution enhancement technologies

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