Dr. Hesham A. Maaty Omar
Engineer at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Calibration, Error analysis, Diffusion, 3D modeling, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling, Process modeling, Photo decomposable quencher

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photovoltaics, Visualization, Electroluminescence, Photomasks, Shape analysis, Optical proximity correction, Photomask technology, Lead, Current controlled current source

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photovoltaics, Image processing, Error analysis, Printing, SRAF, Critical dimension metrology, Semiconducting wafers, Antimony, Tolerancing, Model-based design

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Detection and tracking algorithms, Metals, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Yield improvement, Process modeling, Resolution enhancement technologies

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