Hideaki Abe
Chief Specialist at Toshiba Corp
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Optical inspection, Scatterometry, Process control, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Image processing, Manufacturing, Control systems, Scatterometry, Process control, Photomasks, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

SPIE Journal Paper | October 2, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Calibration, Image processing, Polarizers, Image analysis, Optical testing, Scatterometry, Data processing, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Scattering, X-rays, Silicon, Inspection, Nondestructive evaluation, Scatterometry, Semiconducting wafers, Scatter measurement, Signal detection

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Data modeling, Process control, Finite element methods, Critical dimension metrology, Reactive ion etching, Optimization (mathematics), Photoresist processing, Failure analysis

Showing 5 of 18 publications
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