Mr. Hideaki Mitsui Profile

Hideaki Mitsui

General Manager at HOYA Corp

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 29 September 2010 Paper

Advanced binary film for 193nm lithography extension to sub-32-nm node

Osamu Nozawa, Hiroaki Shishido, Masahiro Hashimoto, Yasushi Ohkubo, Hideaki Mitsui

Proceedings Volume 7823, 78230K (2010) https://doi.org/10.1117/12.866006

KEYWORDS: Photomasks, Tantalum, Reflectivity, Critical dimension metrology, Silicon, Etching, Binary data, Oxides, Chromium, Scanning transmission electron microscopy

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Proceedings Article | 20 March 2010 Paper

Improvement of total quality on EUV mask blanks toward volume production

Tsutomu Shoki, Masaru Mitsui, Minoru Sakamoto, Noriyuki Sakaya, Masato Ootsuka, Tasuto Asakawa, Takeyuki Yamada, Hideaki Mitsui

Proceedings Volume 7636, 76360U (2010) https://doi.org/10.1117/12.849363

KEYWORDS: Extreme ultraviolet, Polishing, Inspection, Extreme ultraviolet lithography, Photomasks, Annealing, Reflectivity, Coating, Mask making, Ruthenium

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Proceedings Article | 11 May 2009 Paper

The art of photomask materials for low-k1-193nm lithography

Masahiro Hashimoto, Hiroyuki Iwashita, Hideaki Mitsui

Proceedings Volume 7379, 73791Q (2009) https://doi.org/10.1117/12.830600

KEYWORDS: Etching, Photomasks, Photoresist processing, Lithography, Optical lithography, Image processing, Silicon, Binary data, Resolution enhancement technologies, Lithographic illumination

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SPIE Journal Paper | 1 April 2009

Hyper-thin resist system for photomask-making in double-patterning generation

Masahiro Hashimoto, Hideaki Mitsui

JM3, Vol. 8, Issue 02, 023001, (April 2009) https://doi.org/10.1117/12.10.1117/1.3116127

KEYWORDS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Image registration, Lithography, Scanning electron microscopy, Inspection

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Proceedings Article | 19 May 2008 Paper

Photomask technology for 32nm node and beyond

Ryugo Hikichi, Hiroyuki Ishii, Hidekazu Migita, Noriko Kakehi, Mochihiro Shimizu, Hideyoshi Takamizawa, Tsugumi Nagano, Masahiro Hashimoto, Hiroyuki Iwashita, Toshiyuki Suzuki, Morio Hosoya, Yasushi Ohkubo, Masao Ushida, Hideaki Mitsui

Proceedings Volume 7028, 702805 (2008) https://doi.org/10.1117/12.793014

KEYWORDS: Chromium, Photomasks, Etching, Binary data, Image processing, Photoresist processing, Photomask technology, Lithography, Multilayers, Absorbance

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Proceedings Article | 19 May 2008 Paper

The ultimate chrome absorber in photomask making

Masahiro Hashimoto, Hiroyuki Iwashita, Atsushi Kominato, Hiroaki Shishido, Masao Ushida, Hideaki Mitsui

Proceedings Volume 7028, 702804 (2008) https://doi.org/10.1117/12.793013

KEYWORDS: Chromium, Etching, Photomasks, SRAF, Lithography, Thin films, Absorbance, Image processing, Oxidation

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Proceedings Article | 28 August 2003 Paper

Development of attenuating PSM shifter for F₂ and high-transmission ArF lithography

Osamu Nozawa, Yuki Shiota, Hideaki Mitsui, Toshiyuki Suzuki, Yasushi Ohkubo, Masao Ushida, Satoshi Yusa, Toshiharu Nishimura, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504047

KEYWORDS: Transmittance, Etching, Dry etching, Chromium, Photomasks, Fluorine, Inspection, Phase shifts, Lithography, Plasma

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Proceedings Article | 22 January 2001 Paper

Development of MoSi-based halftone phase-shift blank and mask fabrication for ArF lithography (Photomask Japamn 2000 Best Presentation Award)

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Naoki Nishida, Yasushi Okubo, Masao Ushida

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410773

KEYWORDS: Photomasks, Lithography, Binary data, Scanning electron microscopy, Chromium, Laser irradiation, Inspection, Phase shifts, Halftones, Mask making

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Proceedings Article | 22 January 2001 Paper

Ion-beam sputter-deposited SiN/TiN attenuating phase-shift photoblanks

Laurent Dieu, Peter Carcia, Hideaki Mitsui, Kunihiko Ueno

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410762

KEYWORDS: Multilayers, Tin, Ion beams, Photomasks, Phase shifts, Etching, Sputter deposition, Transmittance, Dry etching, Chemical analysis

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Proceedings Article | 22 January 2001 Paper

Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing

Michael Hibbs, Masao Ushida, Katherina Babich, Hideaki Mitsui, Anatoly Bourov

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410721

KEYWORDS: Photomasks, Phase shifts, Inspection, Lithography, Etching, Reflectivity, Attenuators, Molybdenum, Manufacturing, Excimer lasers

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Proceedings Article | 19 July 2000 Paper

Development of halftone phase-shift blank and mask fabrication for ArF lithography

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Naoki Nishida, Yasushi Okubo, Masao Ushida

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392099

KEYWORDS: Photomasks, Lithography, Binary data, Halftones, Laser irradiation, Scanning electron microscopy, Mask making, Etching, Optical properties, Defect inspection

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Proceedings Article | 3 February 2000 Paper

Development of embedded attenuated phase-shifting mask (EAPSM) blanks for ArF lithography

Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Hideo Kobayashi, Masao Ushida

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377098

KEYWORDS: Transmittance, 193nm lithography, Photomasks, Lithography, Deep ultraviolet, Optical properties, Chemical lasers, Phase shifts, Laser irradiation, Reflectivity

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