Mr. Hideaki Mitsui
General Manager at HOYA Corp
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Etching, Silicon, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Tantalum, Binary data, Scanning transmission electron microscopy

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Polishing, Annealing, Coating, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Ruthenium

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Etching, Image processing, Silicon, Photomasks, Photoresist processing, Binary data, Resolution enhancement technologies

SPIE Journal Paper | April 1, 2009
JM3 Vol. 8 Issue 02
KEYWORDS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Image registration, Lithography, Scanning electron microscopy, Inspection

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Multilayers, Etching, Image processing, Chromium, Photomasks, Absorbance, Photoresist processing, Photomask technology, Binary data

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Thin films, Lithography, Etching, Image processing, Chromium, Photomasks, Absorbance, SRAF, Oxidation

Showing 5 of 15 publications
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