Mr. Hideaki Takano
at Tokyo Seimitsu Co Ltd
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | April 1, 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Scanners, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Charged-particle lithography

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Microscopes, Electron beam lithography, Electron beams, Distortion, Photomasks, Optical alignment, CCD image sensors, Semiconducting wafers, Charged-particle lithography

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