Hidefumi Matsui
Staff Engineer at Tokyo Electron Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Contamination, Polymers, Spectroscopy, Coating, Adsorption, Transmittance, Critical dimension metrology, Contamination control, Polymer thin films

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Contamination, Polymers, Coating, Control systems, Critical dimension metrology, Line edge roughness, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Optical lithography, Polymers, Coating, Quantitative analysis, Solids, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Liquids, Chemically amplified resists

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