Hidefumi Mukai
at Toshiba Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lenses, Opacity, Etching, Metals, Scanners, Photoresist materials, Photomasks, Double patterning technology, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Anisotropic etching

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Optical lithography, Silica, Etching, Dry etching, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Critical dimension metrology, Plasma

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Opacity, Etching, Photoresist materials, Photomasks, Critical dimension metrology, Semiconducting wafers, Failure analysis, Photoresist developing

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Optical design, Etching, 3D modeling, Design for manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching, Personal protective equipment

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Electron beams, Inspection, Scanning electron microscopy, Optical inspection, Wafer inspection, Photomasks, Mask making, Semiconducting wafers, Tolerancing

Showing 5 of 13 publications
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