Hideharu Kyouda
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Silica, Etching, Particles, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, System on a chip

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Photoresist materials, Line width roughness, Double patterning technology, Reactive ion etching, Photoresist processing, System on a chip

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Defect detection, Image processing, Image resolution, Photomasks, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Contamination, Particles, Coating, Process control, Image filtering, Bridges, Immersion lithography, High volume manufacturing, Thin film coatings, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Scanners, Particles, Coating, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Bridges, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, 193nm lithography, Defect inspection

Showing 5 of 19 publications
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