Dr. Hideki Ina
at Canon Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (17)

Proceedings Article | 4 April 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Lithography, Polarization, Remote sensing, Silicon, Reflectivity, Scatterometry, Immersion lithography, Nanoimprint lithography, Critical dimension metrology, Photoresist processing

Proceedings Article | 3 April 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Lithography, Cadmium, Polarization, Remote sensing, Reflectivity, Scatterometry, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Received signal strength

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Data modeling, Inspection, Control systems, Finite element methods, Semiconductor manufacturing, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Data modeling, Manufacturing, Control systems, Optical testing, Finite element methods, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

Proceedings Article | 25 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Metrology, Silicon, Inspection, Distortion, Scatterometry, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconductors, Data modeling, Inspection, Optical testing, Inverse problems, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Wafer testing

Showing 5 of 17 publications
Conference Committee Involvement (6)
Optical Technology and Measurement for Industrial Applications Conference
23 April 2019 | Yokohama, Japan
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
Optomechatronic Sensors and Instrumentation II
3 October 2006 | Boston, Massachusetts, United States
Showing 5 of 6 published special sections
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