Mr. Hidemichi Imai Profile

Hidemichi Imai

Manager of Photomask Development at Dai Nippon Printing Co Ltd

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Publications (8)

Proceedings Article | 5 October 2023 Paper

Automatic laser writing parameters setting for mature mask production

Giorgio Borzini, Andrea Galbiati, Luca Sartelli, Hidemichi Imai

Proceedings Volume 12802, 1280205 (2023) https://doi.org/10.1117/12.2675407

KEYWORDS: Photomasks, Data corrections, Critical dimension metrology, Mathematical optimization, Statistical analysis, Excel, Bias correction, Analytical research

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Proceedings Article | 23 October 2015 Paper

The capability of lithography simulation based on MVM-SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9635, 96351X (2015) https://doi.org/10.1117/12.2197818

KEYWORDS: Lithography, Photomasks, Scanning electron microscopy, Semiconducting wafers, 3D acquisition, 3D metrology, Defect inspection, Defect detection, Manufacturing, Standards development, Critical dimension metrology, Extreme ultraviolet, Bridges, Image analysis, 193nm lithography

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Proceedings Article | 23 October 2015 Paper

Automatic classification and defect verification based on inspection technology with lithography simulation

Masaya Kato, Hideki Inuzuka, Takeshi Kosuge, Shingo Yoshikawa, Kayoko Kanno, Hidemichi Imai, Hiroyuki Miyashita, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky

Proceedings Volume 9635, 96351W (2015) https://doi.org/10.1117/12.2197814

KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Opacity, Lithography, Semiconducting wafers, Source mask optimization, Reticles, Optical proximity correction, Bridges

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Proceedings Article | 9 July 2015 Paper

Study of defect verification based on lithography simulation with a SEM system

Proceedings Volume 9658, 96580V (2015) https://doi.org/10.1117/12.2197617

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Defect inspection, Optical lithography, Signal to noise ratio, Source mask optimization

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Proceedings Article | 30 June 2012 Paper

A study of hot spot measurement on WLCD

Hidemichi Imai, Shingo Yoshikawa, Hideyoshi Takamizawa, Ute Buttgereit, Thomas Thaler

Proceedings Volume 8441, 844107 (2012) https://doi.org/10.1117/12.978706

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Process control, Current controlled current source, Optical lithography, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 29 September 2010 Paper

SMO mask requirements for low k1 lithography

Seiji Nagahara, Kazuyoshi Kawahara, Hiroshi Yamazaki, Akihiko Ando, Masayuki Naganuma, Kazuyuki Yoshimochi, Takayuki Uchiyama, Ken Nakashima, Hidemichi Imai, Katsuya Hayano, Hidekazu Migita, Eiji Tsujimoto

Proceedings Volume 7823, 782310 (2010) https://doi.org/10.1117/12.864317

KEYWORDS: Photomasks, SRAF, Critical dimension metrology, Inspection, Lithography, Remote sensing, Semiconducting wafers, Source mask optimization, Error analysis, Data modeling

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Proceedings Article | 26 May 2010 Paper

Productivity improvement of high resolution inspection mode on TeraScan 597XR

Hidemichi Imai, Takeshi Kosuge, Kei Mesuda, Eiji Tsujimoto, Hideyoshi Takamizawa

Proceedings Volume 7748, 77480Q (2010) https://doi.org/10.1117/12.867983

KEYWORDS: Inspection, Pellicles, Opacity, Photomasks, Image transmission, Signal to noise ratio, SRAF, Databases, Image resolution, Defect inspection

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Proceedings Article | 11 May 2007 Paper

EUV-mask pattern inspection using current DUV reticle inspection tool

Tsukasa Abe, Akiko Fujii, Shiho Sasaki, Hiroshi Mohri, Hidemichi Imai, Hironobu Takaya, Yasushi Sato, Naoya Hayashi, Yumiko Maenaka

Proceedings Volume 6607, 66070L (2007) https://doi.org/10.1117/12.728935

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Opacity, Defect inspection, Semiconducting wafers, Deep ultraviolet, Etching, Reticles, Reflectivity

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Showing 5 of 8 publications

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