Hidemichi Imai
Manager of Photomask Development at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Opacity, Inspection, Bridges, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, 3D acquisition, Defect detection, Manufacturing, Image analysis, Scanning electron microscopy, 3D metrology, Bridges, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Standards development, 193nm lithography, Defect inspection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Scanning electron microscopy, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Defect inspection

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Optical lithography, Process control, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Current controlled current source

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Data modeling, Remote sensing, Error analysis, Inspection, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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