Mr. Hidemitsu Hakii Profile

Hidemitsu Hakii

at Toppan Printing Co Ltd

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Publications (9)

PROCEEDINGS ARTICLE | June 28, 2013

A study of phase defect measurement on EUV mask by multiple detectors CD-SEM

Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX

KEYWORDS: Electron beams, 3D acquisition, Sensors, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Extreme ultraviolet, Phase measurement, 3D vision, 3D image processing

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PROCEEDINGS ARTICLE | June 30, 2012

CD-Metrology of EUV masks in the presence of charging: measurement and simulation

Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX

KEYWORDS: Oxides, Multilayers, Electron beams, Metrology, Sensors, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Signal detection

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PROCEEDINGS ARTICLE | June 30, 2012

Evaluation of 3D metrology potential using a multiple detector CDSEM

Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX

KEYWORDS: Metrology, Detection and tracking algorithms, Sensors, Image segmentation, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Signal detection, 3D image processing

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PROCEEDINGS ARTICLE | October 14, 2011

Addressing 3D metrology challenges by using a multiple detector CDSEM

Proc. SPIE. 8166, Photomask Technology 2011

KEYWORDS: Lithography, Edge detection, Sensors, Atomic force microscopy, Scanning electron microscopy, Image sensors, 3D metrology, Photomasks, Extreme ultraviolet, Signal detection

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PROCEEDINGS ARTICLE | May 19, 2011

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII

KEYWORDS: Electron beams, Metrology, Detection and tracking algorithms, Sensors, Scanning electron microscopy, 3D metrology, Photomasks, Algorithm development, Signal detection, Polonium

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PROCEEDINGS ARTICLE | April 20, 2011

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV

KEYWORDS: Sensors, Etching, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Tantalum, Signal detection

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PROCEEDINGS ARTICLE | April 20, 2011

Influence of the charging effect on the precision of measuring EUV mask features

Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV

KEYWORDS: Multilayers, Silica, Scattering, Electrons, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Critical dimension metrology, Tantalum

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PROCEEDINGS ARTICLE | September 23, 2009

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Reticles, Cadmium, Scanning electron microscopy, Printing, Distance measurement, Software development, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers

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PROCEEDINGS ARTICLE | May 11, 2009

An evaluation of a new side-wall-angle measurement technique for mask patterns by CD-SEM

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Electron beams, Metrology, Reflectivity, Scanning electron microscopy, Scatterometry, Time metrology, 3D metrology, Pixel resolution, Photomasks, Extreme ultraviolet

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Showing 5 of 9 publications

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