Hidemitsu Hakii
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Electron beams, 3D acquisition, Sensors, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Extreme ultraviolet, Phase measurement, 3D vision, 3D image processing

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Oxides, Multilayers, Electron beams, Metrology, Sensors, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Signal detection

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Metrology, Detection and tracking algorithms, Sensors, Image segmentation, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Signal detection, 3D image processing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Edge detection, Sensors, Atomic force microscopy, Scanning electron microscopy, Image sensors, 3D metrology, Photomasks, Extreme ultraviolet, Signal detection

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Metrology, Detection and tracking algorithms, Sensors, Scanning electron microscopy, 3D metrology, Photomasks, Algorithm development, Signal detection, Polonium

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Sensors, Etching, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Tantalum, Signal detection

Showing 5 of 9 publications
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