Mr. Hidemitsu Hakii Profile

Hidemitsu Hakii

at Toppan Printing Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 28 June 2013

A study of phase defect measurement on EUV mask by multiple detectors CD-SEM

Isao Yonekura, Hidemitsu Hakii, Shinya Morisaki, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX

KEYWORDS: Electron beams, 3D acquisition, Sensors, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Extreme ultraviolet, Phase measurement, 3D vision, 3D image processing

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Proceedings Article | 30 June 2012

CD-Metrology of EUV masks in the presence of charging: measurement and simulation

Sergey Babin, Sergey Borisov, Hidemitsu Hakii, Yasushi Nishiyama, Isao Yonekura

Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX

KEYWORDS: Oxides, Multilayers, Electron beams, Metrology, Sensors, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Signal detection

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Proceedings Article | 30 June 2012

Evaluation of 3D metrology potential using a multiple detector CDSEM

Hidemitsu Hakii, Isao Yonekura, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto, Tsutomu Murakawa, Mitsuo Hiroyama, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX

KEYWORDS: Metrology, Detection and tracking algorithms, Sensors, Image segmentation, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Signal detection, 3D image processing

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Proceedings Article | 14 October 2011

Addressing 3D metrology challenges by using a multiple detector CDSEM

Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto

Proc. SPIE. 8166, Photomask Technology 2011

KEYWORDS: Lithography, Edge detection, Sensors, Atomic force microscopy, Scanning electron microscopy, Image sensors, 3D metrology, Photomasks, Extreme ultraviolet, Signal detection

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Proceedings Article | 19 May 2011

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII

KEYWORDS: Electron beams, Metrology, Detection and tracking algorithms, Sensors, Scanning electron microscopy, 3D metrology, Photomasks, Algorithm development, Signal detection, Polonium

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Proceedings Article | 20 April 2011

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV

KEYWORDS: Sensors, Etching, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Tantalum, Signal detection

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Proceedings Article | 20 April 2011

Influence of the charging effect on the precision of measuring EUV mask features

Yasushi Nishiyama, Hidemitsu Hakii, Isao Yonekura, Keishi Tanaka, Yasutaka Kikuchi

Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV

KEYWORDS: Multilayers, Silica, Scattering, Electrons, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Critical dimension metrology, Tantalum

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Proceedings Article | 23 September 2009

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond

Isao Yonekura, Hidemitsu Hakii, Keishi Tanaka, Masaru Higuchi, Yoshiaki Ogiso, Toshihide Oba, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Reticles, Cadmium, Scanning electron microscopy, Printing, Distance measurement, Software development, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 11 May 2009

An evaluation of a new side-wall-angle measurement technique for mask patterns by CD-SEM

Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yosuke Kojima, Yoshifumi Sakamoto, Keishi Tanaka

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Electron beams, Metrology, Reflectivity, Scanning electron microscopy, Scatterometry, Time metrology, 3D metrology, Pixel resolution, Photomasks, Extreme ultraviolet

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Showing 5 of 9 publications

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