Hidenori Takahashi
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Coating, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, High volume manufacturing, Fluorine, Photoresist processing, Semiconducting wafers, Research management, Chemically amplified resists

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Research management, Polymer thin films

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Research management, Polymer thin films

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Polymers, Diffusion, Electroluminescence, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement, Research management, Absorption

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Glasses, Diffusion, Image resolution, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

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