Hideo Hata
Manager at Canon Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Particles, Inspection, Distortion, Bridges, Scanning probe microscopy, Thin film coatings, Semiconducting wafers, Overlay metrology, Liquids

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Refractive index, Metrology, Polarization, Imaging systems, Sensors, Glasses, Optical alignment, Semiconducting wafers, Overlay metrology, Defect inspection

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Contamination, Water, Scanners, Particles, Laser irradiation, Transmittance, Immersion lithography, Semiconducting wafers, Liquids, Defect inspection

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Microfluidics, Optical lithography, Contamination, Water, Scanners, Control systems, Transmittance, Immersion lithography, Semiconducting wafers, Temperature metrology

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Contamination, Laser development, Laser irradiation, Pellicles, Transmittance, Photomasks, Vacuum ultraviolet, Fluorine, Semiconducting wafers

Showing 5 of 8 publications
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