Dr. Hideo Kobayashi
Group Leader Nano-Fabrication Group at HOYA Corp
SPIE Involvement:
Author
Publications (35)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Fabrication, Lithography, Optical lithography, Etching, Quartz, Line width roughness, Nanoimprint lithography, Reactive ion etching, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 20, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Switches, Optical lithography, Etching, Image processing, Hydrogen, Coating, Nanoimprint lithography, Photoresist processing, Nanolithography

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Fabrication, Lithography, Optical lithography, Dielectrics, Chemistry, Nanoimprint lithography, Semiconducting wafers, Beam propagation method, Standards development, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Quartz, Magnetism, Chromium, Nanoimprint lithography, Beam propagation method, Nanolithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Quartz, Chromium, Nanoimprint lithography, Fluorine, Beam propagation method, Nanolithography

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Cameras, Particles, Printing, Neodymium, Material characterization, Beam propagation method, Photomask technology, Nanolithography, Current controlled current source

Showing 5 of 35 publications
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