Hideo Shite
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Particles, Coating, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, System on a chip

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Particles, Silicon, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Neodymium, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Image processing, Coating, Inspection, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Standards development, Plasma

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Image processing, Scanners, Particles, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Etching, Particles, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 13 publications
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