Hideo Tsuchiya
at NuFlare Technology Inc
SPIE Involvement:
Publications (11)

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96350R (2015) https://doi.org/10.1117/12.2197890
KEYWORDS: Inspection, Deep ultraviolet, Optical inspection, Photomasks, Nanoimprint lithography, Optical resolution, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection

Proceedings Article | 28 June 2013 Paper
Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara
Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363
KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

Proceedings Article | 19 May 2011 Paper
Hideo Tsuchiya, Fumio Ozaki, Kenichi Takahara, Takafumi Inoue, Nobutaka Kikuiri
Proceedings Volume 8081, 80810D (2011) https://doi.org/10.1117/12.899487
KEYWORDS: Photomasks, Inspection, Defect detection, Image processing, Computing systems, Computer simulations, Source mask optimization, Computational lithography, Semiconducting wafers, Electronics

Proceedings Article | 25 May 2010 Paper
Proceedings Volume 7748, 77481G (2010) https://doi.org/10.1117/12.864415
KEYWORDS: Photomasks, Inspection, Defect detection, Semiconducting wafers, Data conversion, Image sensors, Databases, Image transmission, Source mask optimization

Proceedings Article | 16 April 2010 Paper
Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412
KEYWORDS: Inspection, Photomasks, Defect detection, Databases, Data conversion, Computer simulations, Semiconductors, Source mask optimization, Defect inspection, Optical proximity correction

Showing 5 of 11 publications
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