Hideo Tsuchiya
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Optical resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Inspection, Image sensors, Image transmission, Photomasks, Extreme ultraviolet, Double patterning technology

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electronics, Defect detection, Image processing, Inspection, Computing systems, Computer simulations, Photomasks, Source mask optimization, Computational lithography, Semiconducting wafers

Proceedings Article | 25 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Defect detection, Databases, Inspection, Image sensors, Image transmission, Photomasks, Source mask optimization, Data conversion, Semiconducting wafers

Proceedings Article | 16 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Defect detection, Databases, Inspection, Computer simulations, Photomasks, Source mask optimization, Optical proximity correction, Data conversion, Defect inspection

Showing 5 of 11 publications
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