Hidetoshi Ohnuma
Deputy General Manager at Sony Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (27)

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Lithography, Image processing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optical calibration, Resolution enhancement technologies

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Metals, Image processing, Error analysis, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Failure analysis, Yield improvement

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Semiconductors, Lithography, Statistical analysis, Ions, Manufacturing, Distortion, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Lithography, Image processing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Ions, Distortion, Design for manufacturing, Photomasks, Transistors, Optical proximity correction, Semiconducting wafers, Device simulation, Design for manufacturability

Showing 5 of 27 publications
Conference Committee Involvement (3)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
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