Hidetoshi Oishi
at Sony Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Lithography, Image processing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optical calibration, Resolution enhancement technologies

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Metals, Image processing, Error analysis, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Failure analysis, Yield improvement

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Lithography, Metals, Scanners, Printing, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Design for manufacturability

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