Prof. Hideyoshi Takamizawa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Deep ultraviolet, Opacity, Calibration, Metals, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Finite-difference time-domain method, Metals, Image processing, Photomasks, Image enhancement, Immersion lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Reticles, Metrology, Logic, Photomasks, Semiconducting wafers, Autoregressive models, Systems modeling, Overlay metrology, Model-based design, Near field optics

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Optical lithography, Process control, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Current controlled current source

Proceedings Article | 20 May 2011 Paper
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Etching, Chromium, Printing, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Binary data, Resolution enhancement technologies

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top