Mr. Hideyuki Hayashi Profile

Hideyuki Hayashi

at Gigaphoton Inc

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Author

Publications (6)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper

The development progress of the high power LPP-EUV light source using a magnetic field

Hirokazu Hosoda, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Yoshifumi Ueno, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

KEYWORDS: Semiconductors, Mirrors, Light sources, Sputter deposition, Ions, Reflectivity, Magnetism, Extreme ultraviolet, Semiconductor manufacturing, Tin

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Proceedings Article | 21 September 2020 Poster + Presentation

Development progress update of the high power LPP-EUV light source using a magnetic field

Takahiro Tatsumi, Yoshifumi Ueno, Takayuki Yabu, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020

KEYWORDS: Mirrors, Light sources, Chemical species, Hydrogen, Reflectivity, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Pulsed laser operation, Tin

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Proceedings Article | 23 March 2020 Paper

Update of development progress of the high power LPP-EUV light source using a magnetic field

Gouta Niimi, Shinji Nagai, Tsukasa Hori, Yoshifumi Ueno, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Mirrors, Light sources, Magnetism, Control systems, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation, Plasma, Tin

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Proceedings Article | 26 September 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Yuta Takashima, Yoshifumi Ueno, Takayuki Yabu, Tsukasa Hori, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019

KEYWORDS: Light sources, Extreme ultraviolet

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Proceedings Article | 26 March 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Atsushi Ueda, Shinji Nagai, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X

KEYWORDS: Semiconductors, Mirrors, Light sources, Magnetism, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation, Plasma, Tin

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Showing 5 of 6 publications

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