Hideyuki Hayashi
at Gigaphoton Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Mirrors, Light sources, Sputter deposition, Ions, Reflectivity, Magnetism, Extreme ultraviolet, Semiconductor manufacturing, Tin

Proceedings Article | 21 September 2020 Poster + Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Mirrors, Light sources, Chemical species, Hydrogen, Reflectivity, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Pulsed laser operation, Tin

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Light sources, Magnetism, Control systems, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation, Plasma, Tin

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Light sources, Extreme ultraviolet

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Semiconductors, Mirrors, Light sources, Magnetism, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation, Plasma, Tin

Showing 5 of 6 publications
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