Dr. Hideyuki Moribe
at NEC Space Technologies Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Telescopes, Reticles, Image processing, Scanners, Inspection, Image acquisition, Image quality, Image transmission, Beam propagation method, Image quality standards

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Etching, Inspection, Reflectivity, Chromium, Pellicles, Image transmission, Photoresist processing

PROCEEDINGS ARTICLE | May 29, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Sensors, Particles, Inspection, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

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