Hien T. Vu
Software Engineer at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Computing systems, Parallel processing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, SRAF, Resolution enhancement technologies, Design for manufacturability

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Databases

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Radon, Visualization, Databases, Etching, Photomasks, Acquisition tracking and pointing, Data conversion, Neodymium, Semiconducting wafers

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Optical components, Visualization, Computing systems, Control systems, Solids, Optical resolution, Optical proximity correction, Data centers, Optical calibration, Resolution enhancement technologies

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Reticles, Manufacturing, Data processing, Photomasks, Source mask optimization, Optical proximity correction, Optical alignment, Semiconducting wafers, Tolerancing

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