Hiraku Hashimoto
at University of Hyogo
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 25 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Microscopes, Scattering, Particles, Inspection, Atomic force microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

Proceedings Article | 25 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Microscopes, Diffraction, Multilayers, Speckle, CCD cameras, Scatterometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection

SPIE Journal Paper | 18 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

Proceedings Article | 9 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Phase contrast, Reflection, CCD cameras, Phase imaging, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reconstruction algorithms

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Multilayers, Switching, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Spherical lenses

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