Mr. Hiroaki Takikawa Profile

Hiroaki Takikawa

Section Manager at ASM Japan K.K.

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Author

Publications (3)

Proceedings Article | 23 March 2016 Paper

450mm etch process development and process chamber evaluation using 193i DSA guided pattern

Wenli Collison, Yii-Cheng Lin, Shannon Dunn, Hiroaki Takikawa, James Paris, Lucy Chen, Troy Detrick, Jun Belen, George Stojakovic, Michael Goss, Norman Fish, Minjoon Park, Chih-Ming Sun, Mark Kelling, Pinyen Lin

Proceedings Volume 9782, 97820M (2016) https://doi.org/10.1117/12.2218537

KEYWORDS: Etching, Semiconducting wafers, Data processing, Lithography, Directed self assembly, Optical lithography, Tin, Photoresist processing, Line edge roughness, Polymethylmethacrylate

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Proceedings Article | 26 March 2010 Paper

Simplified double patterning process with non-topcoat self-freezing resist

Tomohisa Fujisawa, Yusuke Anno, Masafumi Hori, Goji Wakamatsu, Michihiro Mita, Koji Ito, Hiromitsu Tanaka, Kenji Hoshiko, Takeo Shioya, Kentaro Goto, Yoshifumi Ogawa, Hiroaki Takikawa, Yutaka Kozuma, Koichi Fujiwara, Makoto Sugiura, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7639, 76392Y (2010) https://doi.org/10.1117/12.846493

KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

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Proceedings Article | 10 May 2005 Paper

Flexible alignment mark design applications using a next generation phase grating alignment system

Paul Hinnen, Hyun-Woo Lee, Stefan Keij, Hiroaki Takikawa, Keita Asanuma, Kazutaka Ishigo, Tatsuhiko Higashiki

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599494

KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Overlay metrology, Signal processing, Metrology, Optical design, Neodymium, Diffraction, Diffraction gratings

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