Hirohisa Okushima
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Ions, Silicon, Coating, Scanning electron microscopy, Ion beams, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Gallium, Scanning transmission electron microscopy

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