Mr. Hirohito Okuda
Researcher at Hitachi Ltd
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Signal to noise ratio, Defect detection, Sensors, Image processing, Inspection, Scanning electron microscopy, Wafer inspection, Image enhancement, Semiconducting wafers, Signal detection

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