Hiroichi Kawahira
Vice President at Murata Manufacturing Co., Ltd.
SPIE Involvement:
Conference Chair | Conference Program Committee | Symposium Chair | Conference Co-Chair | Author
Publications (53)

SPIE Conference Volume | 17 October 2008

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Carbon, Reticles, Magnesium, Contamination, Chemical species, Ions, Raman spectroscopy, Photomasks, Aluminum, Sodium

SPIE Conference Volume | 2 October 2007

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Semiconducting wafers, Plasma treatment, Plasma

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Oxides, Lithography, Refractive index, Polarization, Silicon, Reflectivity, Photoresist materials, Immersion lithography, Optimization (mathematics)

Showing 5 of 53 publications
Conference Committee Involvement (22)
Photomask Technology
7 October 2008 | Monterey, California, United States
Design for Manufacturability through Design-Process Integration II
28 February 2008 | San Jose, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
SPIE Photomask Technology
17 September 2007 | Monterey, United States
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Showing 5 of 22 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top