Hiroichi Kawahira
Vice President at Murata Manufacturing Co., Ltd.
SPIE Involvement:
Author
Publications (48)

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Ions, Photomasks, Reticles, Raman spectroscopy, Contamination, Carbon, Chemical species, Sodium, Magnesium, Aluminum

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Metals, Photomasks, SRAF, Optical proximity correction, Signal to noise ratio, Error analysis, Critical dimension metrology, Integrated circuits, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Critical dimension metrology, Etching, Lithography, Scatterometry, Photomasks, Photoresist processing, Process control, Optical proximity correction, Semiconductors, Chemical elements

Showing 5 of 48 publications
Proceedings Volume Editor (5)

SPIE Conference Volume | 17 October 2008

SPIE Conference Volume | 2 October 2007

SPIE Conference Volume | 1 August 2002

SPIE Conference Volume | 5 September 2001

Conference Committee Involvement (22)
Photomask Technology
7 October 2008 | Monterey, California, United States
Design for Manufacturability through Design-Process Integration II
28 February 2008 | San Jose, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
SPIE Photomask Technology
17 September 2007 | Monterey, United States
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Showing 5 of 22 Conference Committees
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