Hiroie Matsumoto
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Oxides, Contamination, Etching, Metals, Photoresist materials, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Photoresist developing, Tin

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing

Proceedings Article | 17 March 2015 Paper
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Plasma

Proceedings Article | 13 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Carbon, Lithography, Optical lithography, Inspection, Signal processing, Wafer inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top