PROCEEDINGS ARTICLE | October 18, 2004
Proc. SPIE. 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
KEYWORDS: Actuators, Mirrors, X-ray optics, X-rays, X-ray microscopy, Optical simulations, Optical alignment, Geometrical optics, Mirror pointing, Hard x-rays
The spatial resolution of the scanning X-ray microscopy apparently depends on the beam size of the focused X-ray. Recently, highly accurate elliptical mirrors were reported to be fabricated, and nearly diffraction-limited line focusing was achieved. In this study, to realize diffraction-limited and 2-dimentional focusing with such highly accurate mirrors, accuracies to be realized in mirror alignings, for example, adjusting the glancing angle and the in-plane rotation, were estimated by employing two types of simulators. They are appropriately based on geometrical or wave-optical theories. They are alternatively employed according to the degree of accuracy required in the mirror alignment. A focusing unit with the adjusting mechanism fulfilling the required alignment accuracies was constructed, and the relationships between the alignment errors and focused beam profiles were quantitatively examined at the 1km-long beamline (BL29XUL) of SPring-8. Obtained results were in good agreement with the calculated results. Additionally, the alignment accuracy to be realized in the K-B unit equipping mirrors of larger NA (numerical aperture) was calculated to realize sufficient performances in focusing.
