Hiroki Futatsuya
manager at Fujitsu Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Semiconductors, Digital image processing, Graphics processing units, Manufacturing, Computing systems, Fourier transforms, Data processing, Distributed computing, Photomasks, Optical proximity correction

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Photomasks, Optical simulations, Optical proximity correction, SRAF, Convolution, Critical dimension metrology, Semiconducting wafers, Bessel functions, Optics manufacturing

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Reticles, Image quality, Design for manufacturing, Photomasks, Optical simulations, Double patterning technology, Logic devices, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Logic, Optical lithography, Lithographic illumination, Photomasks, SRAF, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 13 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Data modeling, Diffusion, Manufacturing, Monte Carlo methods, Bridges, Design for manufacturing, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Light scattering, Manufacturing, Printing, Photomasks, Acquisition tracking and pointing, Optical proximity correction, Semiconducting wafers, Model-based design

Showing 5 of 9 publications
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